• DocumentCode
    1471565
  • Title

    Automatic generation of thin film process flows. II. Recipe generation, flow evaluation, and system framework

  • Author

    Zaman, Mohammed H. ; Carlen, Edwin T. ; Mastrangelo, Carlos H.

  • Author_Institution
    Microcosm Technol., Cambridge, MA, USA
  • Volume
    12
  • Issue
    1
  • fYear
    1999
  • fDate
    2/1/1999 12:00:00 AM
  • Firstpage
    129
  • Lastpage
    138
  • Abstract
    This paper is the second in a series of two papers describing the methodology and algorithms used in the development of MISTIC (Michigan synthesis tools for integrated circuits). Part I [see ibid., vol. 12, no. 1, Feb. 1999] discussed the basic topological algorithms used to produce generic sequences of processing steps required for the fabrication of a given device structure. Part II discusses the expansion of these sequences into complete process flows. This procedure involves the selection of specific recipes from a set of available processing resources and the calculation of recipe parameters. These processing resources are stored in a database central to the MISTIC system framework. Since many process flows are generated for a given device, the paper also discusses the calculation of suitable figures of merit. The capabilities of the MISTIC system are demonstrated with a BiCMOS example. The MISTIC system framework which contains the basic compiler and several supporting modules: a device builder, process viewer, and database editor is also presented
  • Keywords
    BiCMOS integrated circuits; application specific integrated circuits; circuit simulation; discrete event simulation; integrated circuit manufacture; technology CAD (electronics); BiCMOS; MISTIC; Michigan synthesis tools; TCAD; device builder; flow evaluation; process viewer; processing resources; recipe generation; system framework; thin film process flows; BiCMOS integrated circuits; Databases; Dry etching; Fabrication; History; Integrated circuit synthesis; Process design; Sensor phenomena and characterization; Transistors; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.744534
  • Filename
    744534