DocumentCode
1473528
Title
Diamond grit-based field emission cathodes
Author
Geis, M.W. ; Twichell, J.C. ; Efrernow, N.N. ; Krohn, K.E. ; Stern, M.B. ; Lyszczarz, T.M.
Author_Institution
Lincoln Lab., MIT, Lexington, MA, USA
Volume
18
Issue
12
fYear
1997
Firstpage
595
Lastpage
598
Abstract
This letter describes the fabrication and operation of diamond grit gated cathodes. The structure is similar to Spindt-type cathode, but the field emission cone is replaced with a more planar diamond grit layer 50 to 200 nm thick. Although the minimum lithographic dimension of these cathodes is from 1 to 5 μm, these devices have exceptionally low turn-on voltages, 5 to 7 V. Cathode current noise is less than 2.5% rms with a maximum absolute current variation of 6.7% over a 6 h period. These devices can operate in pressures of nitrogen above 133 Pa (1 Torr). Although operation in 6.6×10/sup -2/ Pa (5×10/sup -4/ Torr) with more reactive gasses, O2 or H2S, degrades performance, the cathodes recover when the pressure is reduced to /spl les/1.3×10/sup -4/ Pa (1×10/sup -6/ Torr). Gate current varies from 0.2 to 100 times the emitted current and depends on the technique used to deposit the diamond grit. High current densities (>10 A cm/sup -2/), low gate voltages (<50 V), low emission noise, excellent longevity, temporal uniformity, and ease of fabrication make these devices potential cathodes for flat panel displays. However, excessive gate current and unsatisfactory processing reproducibility at present limit their general application.
Keywords
cathodes; current density; diamond; electron field emission; elemental semiconductors; semiconductor device noise; vacuum microelectronics; 1 to 5 mum; 1 torr; 1E-6 torr; 5 to 7 V; 50 V; 50 to 200 nm; 5E-4 torr; C; H/sub 2/S; N/sub 2/; N/sub 2/ pressure; O/sub 2/; Spindt-type cathode; cathode current noise; diamond grit-based field emission cathodes; emitted current; flat panel displays; gate current; high current density; longevity; low emission noise; low gate voltage; low turn-on voltage; maximum absolute current variation; minimum lithographic dimension; planar diamond grit layer; reactive gas environment; temporal uniformity; Cathodes; Degradation; Dielectric substrates; Electron emission; Fabrication; Flat panel displays; Impurities; Low voltage; Nitrogen; Silicon;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.644082
Filename
644082
Link To Document