• DocumentCode
    1475646
  • Title

    High-temperature superconducting edge-type Josephson junctions with modified interface barriers

  • Author

    Satoh, Tetsuro ; Wen, Jian-Guo ; Hidaka, Mutsuo ; Tahara, Shuichi ; Koshizuka, Naoki ; Tanaka, Shoji

  • Author_Institution
    Fundamental Res. Labs., NEC Corp., Ibaraki, Japan
  • Volume
    11
  • Issue
    1
  • fYear
    2001
  • fDate
    3/1/2001 12:00:00 AM
  • Firstpage
    770
  • Lastpage
    775
  • Abstract
    This paper describes recent results on the fabrication, electrical characteristics, and microstructure of high-temperature superconducting edge-type Josephson junctions with modified interface barriers. The barriers are formed by surface modification of the YBa2Cu3O7-δ base layer. This process involves structural and chemical modification by ion irradiation and crystallization by annealing. The junctions showed resistively and capacitively shunted junction-like current-voltage characteristics and excellent uniformity. The spread in the critical current for one hundred junctions was smaller than 1σ=10% at 4.2 K. The uniformity is now approaching 1σ=5%. The junction characteristics have remained the same after two-year room-temperature storage. They also showed no change after high-temperature processing at about 700°C. High-resolution transmission electron microscopy revealed that both the crystal structure and chemical composition in relatively thick barriers are different from those of YBa2Cu3O7-δ
  • Keywords
    Josephson effect; annealing; barium compounds; critical currents; crystallisation; high-temperature superconductors; ion beam effects; surface treatment; transmission electron microscopy; yttrium compounds; 4.2 K; 700 C; RCSJ model; YBa2Cu3O7-δ; YBa2Cu3O7; annealing; chemical composition; critical current; crystal structure; crystallization; current-voltage characteristics; edge-type Josephson junction; electrical characteristics; fabrication; high temperature processing; high temperature superconductor; high-resolution transmission electron microscopy; interface barrier; interface engineered junction; ion irradiation; microstructure; surface treatment; Annealing; Chemical processes; Crystallization; Current-voltage characteristics; Electric variables; Fabrication; High temperature superconductors; Josephson junctions; Microstructure; Superconducting epitaxial layers;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.919459
  • Filename
    919459