Study on fabrication conditions of the interface-treated trilayer junctions

Author

Maruyama, M. ; Yoshida, K. ; Kito, T. ; Furutani, T. ; Yoshinaga, Y. ; Horibe, M. ; Inoue, M. ; Fujimaki, A. ; Hayakawa, H.

Author_Institution

Dept. of Quantum Eng., Nagoya Univ., Japan

Volume

11

Issue

1

fYear

2001

fDate

3/1/2001 12:00:00 AM

Firstpage

788

Lastpage

790

Abstract

We have investigated the effects of fabrication conditions on the properties of the interface-treated trilayer Josephson junctions. In the junctions, barriers are formed by ion milling, followed by annealing. We controlled the accelerating voltage for the milling process and the gas pressure for the annealing process. Josephson currents were observed in the junctions fabricated under various conditions. It was found that higher accelerating voltage contributes to the reduction of leakage paths in the barriers. However, clear dependence of the Josephson currents on the conditions was not observed in contrast to the results for the ramp-edge junctions

Keywords

Josephson effect; annealing; ion beam effects; Josephson current; accelerating voltage; annealing; fabrication; gas pressure; interface engineered Josephson junction; interface treatment; ion milling; ramp edge junction; trilayer junction; Acceleration; Annealing; Fabrication; Josephson effect; Josephson junctions; Milling; Superconducting films; Temperature; Voltage; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.919463

Filename

919463