Title :
Role of plasma-aided manufacturing in semiconductor fabrication
Author :
Hershkowitz, Noah
Author_Institution :
Eng. Res. Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA
fDate :
12/1/1998 12:00:00 AM
Abstract :
A brief review is presented of the application of plasma-aided manufacturing to semiconductor fabrication. Emphasis is placed on current state-of-the-art techniques for which plasma physics plays a significant role and on current problems that remain to be solved
Keywords :
plasma materials processing; reviews; semiconductor technology; sputter etching; surface treatment; current problems; etching; plasma physics; plasma-aided manufacturing; processing techniques; review; semiconductor fabrication; state-of-the-art techniques; Atmospheric-pressure plasmas; Etching; Fabrication; Plasma applications; Plasma chemistry; Plasma immersion ion implantation; Plasma materials processing; Plasma properties; Plasma sources; Semiconductor device manufacture;
Journal_Title :
Plasma Science, IEEE Transactions on
