• DocumentCode
    1475974
  • Title

    Transport of a cathodic arc plasma in a straight, magnetized duct

  • Author

    Cluggish, Brian P.

  • Author_Institution
    Los Alamos Nat. Lab., NM, USA
  • Volume
    26
  • Issue
    6
  • fYear
    1998
  • fDate
    12/1/1998 12:00:00 AM
  • Firstpage
    1645
  • Lastpage
    1652
  • Abstract
    Measurements are presented of the transport of a supersonic, cathodic-arc plasma through a straight, magnetized duct. These measurements are compared to previous work on curved ducts, in order to illuminate the effect of duct curvature on the transport. The axial ion flux through the straight duct decays as ions are lost to the walls. This decay is exponential, with a scale length of seven duct radii; this is two to three times longer than in most experiments on curved ducts. The scale length is independent of the magnetic field strength for fields from 5-40 mT. (For this range of magnetic fields, the electron Larmor radius varies from 0.03-0.003 duct radii; while the ion Larmor radius varies from 4-0.5 duct radii.) This differs from previous experiments with curved ducts, where the attenuation length generally increases with magnetic field. Also in contrast to experiments on curved ducts, biasing the duct wall to positive voltages similar to the ion energy produces only a slight decrease in the ion losses to the wall. The observed scale length for ion loss and its independence from the magnetic field strength are in quantitative agreement with a plasma fluid simulation. Differences in plasma transport through straight and curved ducts are discussed
  • Keywords
    arcs (electric); plasma simulation; plasma transport processes; axial ion flux; cathodic arc plasma transport; duct curvature; electron Larmor radius; exponential decay; ion energy; magnetic fields; plasma fluid simulation; scale length; straight magnetized duct; supersonic cathodic-arc plasma; Attenuation; Ducts; Electrons; Magnetic fields; Magnetic flux; Magnetic liquids; Plasma measurements; Plasma simulation; Plasma transport processes; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.747882
  • Filename
    747882