• DocumentCode
    1476004
  • Title

    The atmospheric-pressure plasma jet: a review and comparison to other plasma sources

  • Author

    Schütze, Andreas ; Jeong, James Y. ; Babayan, Steven E. ; Park, Jaeyoung ; Selwyn, Gary S. ; Hicks, Robert F.

  • Author_Institution
    Dept. of Chem. Eng., California Univ., Los Angeles, CA, USA
  • Volume
    26
  • Issue
    6
  • fYear
    1998
  • fDate
    12/1/1998 12:00:00 AM
  • Firstpage
    1685
  • Lastpage
    1694
  • Abstract
    Atmospheric-pressure plasmas are used in a variety of materials processes. Traditional sources include transferred arcs, plasma torches, corona discharges, and dielectric barrier discharges. In arcs and torches, the electron and neutral temperatures exceed 3000°C and the densities of charge species range from 1016-1019 cm-3. Due to the high gas temperature, these plasmas are used primarily in metallurgy. Corona and dielectric barrier discharges produce nonequilibrium plasmas with gas temperatures between 50-400°C and densities of charged species typical of weakly ionized gases. However, since these discharges are nonuniform, their use in materials processing is limited. Recently, an atmospheric-pressure plasma jet has been developed, which exhibits many characteristics of a conventional, low-pressure glow discharge. In the jet, the gas temperature ranges from 25-200°C, charged-particle densities are 10 11-1012 cm-3, and reactive species are present in high concentrations, i.e., 10-100 ppm. Since this source may be scaled to treat large areas, it could be used in applications which have been restricted to vacuum. In this paper, the physics and chemistry of the plasma jet and other atmospheric-pressure sources are reviewed
  • Keywords
    corona; plasma density; plasma jets; plasma materials processing; plasma temperature; plasma torches; reviews; 25 to 400 C; 3000 C; atmospheric-pressure plasma jet; charged-particle densities; corona discharges; dielectric barrier discharges; electron temperature; gas temperature; low-pressure glow discharge; materials processes; materials processing; metallurgy; neutral temperature; plasma sources; plasma torches; reactive species; review; transferred arcs; weakly ionized gases; Atmospheric-pressure plasmas; Corona; Dielectrics; Fault location; Plasma chemistry; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.747887
  • Filename
    747887