DocumentCode :
1477127
Title :
YBaCuO deposition by MOCVD on metallic substrates: a comparative study on buffer layers
Author :
Jimenez, Carmen ; Weiss, François ; Sénateur, Jean-Pierre ; Abrutis, Adulfas ; Krellmann, Mathias ; Selbmann, Dietmar ; Eickemeyer, Joerg ; Stadel, Oliver ; Wahl, George
Author_Institution :
Lab. des Mater. et du Genie Phys., Saint Martin d´´Heres, France
Volume :
11
Issue :
1
fYear :
2001
fDate :
3/1/2001 12:00:00 AM
Firstpage :
2905
Lastpage :
2908
Abstract :
YBaCuO films of about 1 μm thickness have been deposited by metal organic chemical vapor deposition (MOCVD) on biaxially textured Ni-based substrates. Different buffer layers (MgO, YSZ, CeO2), and also NiO epitaxially grown on Ni, have been tested with subsequent YBCO deposition in the same reactor. When using NiO as first buffer layer, Ni-based substrates were oxidized in a rapid thermal processing system or in a conventional furnace previous to deposition of the second buffer layer. In the present work, we study different conductor architectures from the point of view of Tc, Jc (77K), epitaxial growth, and chemical stability of the structure
Keywords :
MOCVD; barium compounds; critical current density (superconductivity); high-temperature superconductors; rapid thermal processing; superconducting epitaxial layers; superconducting transition temperature; vapour phase epitaxial growth; yttrium compounds; 1 mum; CeO2; HTSC; MOCVD; MgO; Ni; NiO; Y2O3ZrO2; YBaCuO; YBaCuO deposition; biaxially textured Ni-based substrates; buffer layers; chemical stability; conductor architectures; critical current density; epitaxial growth; metal organic chemical vapor deposition; metallic substrates; rapid thermal processing system; surface oxidation epitaxy; transition temperature; Buffer layers; Chemical vapor deposition; Furnaces; Inductors; MOCVD; Organic chemicals; Rapid thermal processing; Substrates; Testing; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.919670
Filename :
919670
Link To Document :
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