YBa2Cu3O7-x sputter deposition from rotatable targets: a scalable approach for YBa2Cu3 O7-x coated conductors

Worldwide research has been done on sputter deposition of YBa₂Cu₃O_7-x (YBCO). In most cases, planar ceramic targets were used. Due to a lack of suitable target tubes, YBCO deposition from rotatable magnetrons was not yet explored. Rotatable magnetron sputter sources are however standard equipment in the large-scale sputter industry. Therefore, the development of sputter deposition from YBCO rotatable targets would facilitate the realization of a large-scale deposition process for YBCO coated conductor. Several problems encountered with sputter deposition of YBCO are related to the fact that the input power and the discharge voltage are too low. In a rotatable magnetron, the power input can be much higher compared to a planar magnetron with the same “race-track” area. By using flame sprayed target tubes, it was possible to demonstrate the possibilities of YBCO deposition from rotatable magnetrons. This research showed that an increased power input is indeed possible resulting in an increased deposition speed and improved discharge characteristics