Title :
Ion implantation in semiconductor device technology
fDate :
6/1/1972 12:00:00 AM
Abstract :
The role of ion implantation in the fabrication of semiconductor devices is reviewed with special reference to silicon planar technology. The applications of ion implantation to various devices is discussed in detail. A summary is given of the present state of the art in the compound semiconductor field.
Keywords :
elemental semiconductors; ion implantation; semiconductor materials; silicon; ion implantation; semiconductor devices; silicon planar technology;
Journal_Title :
Radio and Electronic Engineer
DOI :
10.1049/ree.1972.0044
