DocumentCode
1478160
Title
Demonstration of an SiC neutron detector for high-radiation environments
Author
Seshadri, S. ; Dulloo, A.R. ; Ruddy, Frank H. ; Seidel, John G. ; Rowland, L.B.
Author_Institution
Sci. & Technol. Center, Northrop Grumman Corp., Pittsburgh, PA, USA
Volume
46
Issue
3
fYear
1999
fDate
3/1/1999 12:00:00 AM
Firstpage
567
Lastpage
571
Abstract
Neutron response studies have been performed on Schottky diodes fabricated using 4H-SiC material. These studies indicate that neutron detection using SiC diodes is possible without significant degradation in the energy resolution, noise characteristics or, most importantly, the neutron counting rate even after exposure to neutron fluences of 3.4×1017 nth/cm2 (1×1017 nfast/cm2; En.fast >1 MeV), the highest yet examined. The results represent orders of magnitude increased device lifetime in neutron fields compared to commercial silicon based detectors. Additionally, detector response was found to be linear up to thermal neutron fluxes of 2000 nth/cm2/s. However, degradation in the charge collection efficiency due to neutron damage-induced defects prevented self-biased operation after exposures above ~5.7×1016 n th/cm2. A carrier removal rate of 9.7±0.7 cm-1 was calculated from C-V doping profile measurements on neutron irradiated samples. These results demonstrate the viability of SiC-based detectors for a variety of radiation monitoring applications
Keywords
Schottky diodes; high-temperature electronics; neutron detection; semiconductor counters; semiconductor device measurement; silicon compounds; wide band gap semiconductors; 4H-SiC material; C-V doping profile measurements; Schottky diodes; SiC; SiC neutron detector; energy resolution; high-radiation environments; neutron counting rate; noise characteristics; radiation monitoring applications; self-biased operation; Neutrons; Photonic band gap; Radiation detectors; Radiation monitoring; Schottky diodes; Semiconductor device noise; Semiconductor diodes; Semiconductor radiation detectors; Silicon carbide; Working environment noise;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.748878
Filename
748878
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