DocumentCode :
147830
Title :
S2-T3: Next generation gallium nitride HEMTs enabled by diamond substrates
Author :
Tyhach, M. ; Altman, D. ; Bernstein, S. ; Korenstein, R. ; Cho, Jeon-Wook ; Goodson, Kenneth E. ; Francis, Daniel ; Faili, F. ; Ejeckam, F. ; Kim, Sungho ; Graham, Samual
Author_Institution :
Raytheon, Tewksbury, MA, USA
fYear :
2014
fDate :
5-7 Aug. 2014
Firstpage :
1
Lastpage :
4
Abstract :
This paper describes the thermal and electrical performance of GaN on Diamond devices, where the GaN on Diamond substrates are fabricated by taking epi from a host growth substrate and replacing it through direct growth of CVD diamond. We have found GaN on Diamond material improves thermal performance while maintaining electrical performance. This work demonstrates that GaN on Diamond technology can form the foundation of a next generation GaN device with 3X (or more) higher areal power density.
Keywords :
III-V semiconductors; chemical vapour deposition; diamond; gallium compounds; high electron mobility transistors; wide band gap semiconductors; C; CVD; GaN on diamond devices; GaN-C; diamond substrates; electrical performance; next generation gallium nitride HEMT; thermal performance; Density measurement; Diamonds; Gallium nitride; Logic gates; Performance evaluation; Silicon carbide; Transistors; GaN; HEMT; diamond; thermal interface resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lester Eastman Conference on High Performance Devices (LEC), 2014
Conference_Location :
Ithaca, NY
Type :
conf
DOI :
10.1109/LEC.2014.6951557
Filename :
6951557
Link To Document :
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