DocumentCode
1478751
Title
Model for the Resistive Switching Effect in
MIM Structures Based on the Transmission Properties of Narrow Constrictions
Author
Miranda, Enrique A. ; Walczyk, Christian ; Wenger, Christian ; Schroeder, Thomas
Author_Institution
Escola Tec. Super. d´´Eng., Univ. Autonoma de Barcelona, Bellaterra, Spain
Volume
31
Issue
6
fYear
2010
fDate
6/1/2010 12:00:00 AM
Firstpage
609
Lastpage
611
Abstract
A physics-based analytical model for the current-voltage (I-V) characteristics corresponding to the low and high resistive states in electroformed metal-insulator-metal structures with HfO2 layers is proposed. The model relies on the Landauer theory for the electron transport in mesoscopic systems. The switching phenomenon is ascribed to the modulation of the constriction´s bottleneck cross-sectional area associated with atomic rearrangements within the confinement path. The extracted parameter values allow one to conclude that the length and radius of the region that controls the conduction characteristics are in the nanometer range.
Keywords
MIM structures; electric breakdown; electrical conductivity; electrical resistivity; electron transport theory; gold; hafnium compounds; high-k dielectric thin films; mesoscopic systems; titanium compounds; Au-HfO2-TiN; Landauer theory; MIM structures; atomic rearrangements; bottleneck cross-sectional area; conduction characteristics; confinement path; current-voltage characteristics; electroformed metal-insulator-metal structures; electron transport; mesoscopic systems; resistive states; resistive switching effect; transmission properties; Dielectric breakdown; high-$k$ ; metal–insulator–metal (MIM);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2010.2046310
Filename
5454260
Link To Document