• DocumentCode
    1478751
  • Title

    Model for the Resistive Switching Effect in  \\hbox {HfO}_{2} MIM Structures Based on the Transmission Properties of Narrow Constrictions

  • Author

    Miranda, Enrique A. ; Walczyk, Christian ; Wenger, Christian ; Schroeder, Thomas

  • Author_Institution
    Escola Tec. Super. d´´Eng., Univ. Autonoma de Barcelona, Bellaterra, Spain
  • Volume
    31
  • Issue
    6
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    609
  • Lastpage
    611
  • Abstract
    A physics-based analytical model for the current-voltage (I-V) characteristics corresponding to the low and high resistive states in electroformed metal-insulator-metal structures with HfO2 layers is proposed. The model relies on the Landauer theory for the electron transport in mesoscopic systems. The switching phenomenon is ascribed to the modulation of the constriction´s bottleneck cross-sectional area associated with atomic rearrangements within the confinement path. The extracted parameter values allow one to conclude that the length and radius of the region that controls the conduction characteristics are in the nanometer range.
  • Keywords
    MIM structures; electric breakdown; electrical conductivity; electrical resistivity; electron transport theory; gold; hafnium compounds; high-k dielectric thin films; mesoscopic systems; titanium compounds; Au-HfO2-TiN; Landauer theory; MIM structures; atomic rearrangements; bottleneck cross-sectional area; conduction characteristics; confinement path; current-voltage characteristics; electroformed metal-insulator-metal structures; electron transport; mesoscopic systems; resistive states; resistive switching effect; transmission properties; Dielectric breakdown; high-$k$ ; metal–insulator–metal (MIM);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2046310
  • Filename
    5454260