DocumentCode :
1478780
Title :
Properties of NbTiN thin films prepared by reactive DC magnetron sputtering
Author :
Myoren, Hiroaki ; Shimizu, Takayuki ; Iizuka, Takeshi ; Takada, Susumu
Author_Institution :
Fac. of Eng., Saitama Univ., Urawa, Japan
Volume :
11
Issue :
1
fYear :
2001
fDate :
3/1/2001 12:00:00 AM
Firstpage :
3828
Lastpage :
3831
Abstract :
We have prepared Nb1-xTixN (NbTiN) thin films by reactive dc magnetron sputtering without intentional heating. Superconducting properties were strongly related to sputtering conditions. Lattice parameters of NbTiN films approached that of bulk NbTiN on decreasing the N2 mole fraction in Ar and N2 sputtering gas mixture. The film orientation was also strongly related to the sputtering conditions such as gas pressure. NbN thin films could grow epitaxially on MgO(100) substrates and showed very smooth surfaces. We found that smooth NbTiN films could be obtained on MgO(100) substrates with an epitaxially grown NbN template layer
Keywords :
lattice constants; niobium compounds; sputter deposition; superconducting thin films; superconducting transition temperature; surface structure; titanium compounds; MgO; MgO(100) substrates; N2 mole fraction; NbTiN; epitaxially grown NbN template layer; film orientation; gas pressure; lattice parameters; reactive DC magnetron sputtering; thin films; Heating; Magnetic properties; Niobium; Sputtering; Substrates; Superconducting epitaxial layers; Superconducting films; Superconducting magnets; Superconducting thin films; Transistors;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.919899
Filename :
919899
Link To Document :
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