DocumentCode
1478827
Title
Physics-Based Compact Model for III–V Digital Logic FETs Including Gate Tunneling Leakage and Parasitic Capacitance
Author
Oh, Saeroonter ; Wong, H. -S Philip
Author_Institution
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
Volume
58
Issue
4
fYear
2011
fDate
4/1/2011 12:00:00 AM
Firstpage
1068
Lastpage
1075
Abstract
A physics-based compact model is developed for III-V field-effect transistors for digital logic applications. Quasi-ballistic ratios, trapezoidal quantum-well subband energy levels, and 2-D source/drain influence on both electrostatics and capacitance are considered. Furthermore, gate tunneling leakage current and parasitic capacitance models are included. These latter effects are important in future technology logic applications, particularly in circuits such as high-density cache arrays. In this paper, we describe the III-V compact model including the gate leakage current and parasitic capacitance analytical models. The efficacy of the compact model in a practical circuit environment is demonstrated using transient simulations of a 6T-static random access memory cell. In addition, we provide design guidelines for optimization of the intrinsic and the extrinsic structure with regard to the parasitic effects.
Keywords
III-V semiconductors; SRAM chips; electrostatics; energy states; high electron mobility transistors; leakage currents; logic circuits; semiconductor quantum wells; tunnelling; 2D source-drain; 6T-static random access memory cell; III-V digital logic FET; electrostatic; gate tunneling leakage; gate tunneling leakage current; high-density cache arrays; parasitic capacitance analytical models; physics-based compact model; practical circuit environment; quasiballistic ratio; transient simulation; trapezoidal quantum-well subband energy level; HEMTs; Integrated circuit modeling; Logic gates; MODFETs; Parasitic capacitance; Tunneling; Compact model; III–V compound semiconductor; III–V field-effect transistor (FET); digital logic; gate tunneling leakage; parasitic capacitance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2105875
Filename
5737871
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