• DocumentCode
    1478917
  • Title

    Comparative Study of Silicon-Based Ultraviolet Photodetectors

  • Author

    Shi, Lei ; Nihtianov, Stoyan

  • Author_Institution
    Dept. of Micro-Electron. & Comput. Eng., Delft Univ. of Technol., Delft, Netherlands
  • Volume
    12
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    2453
  • Lastpage
    2459
  • Abstract
    This review article presents a comparative study of different silicon-based ultraviolet (UV) photodetector technologies. After a brief introduction and classification of UV photodetectors, a general comparison is made between the two most popular UV-detector solid-state materials: silicon and wide-band gap semiconductors (diamond, SiC, III-nitrides, and some III-V compounds). Particularly, the advantages of the Si-based technologies are discussed. Further in this paper, the analyses are restricted to silicon UV photodetectors. The theoretically attainable sensitivity in the UV spectral range of Si-based photodetectors is discussed. Different device structures and their working principle are shortly reviewed, followed by a comparison of the state-of-the-art Si-based UV photodetectors. By linking the device structure to the reported optical performance, the advantages and drawbacks of different structures are detailed. Finally, a number of key factors for designing high performance Si-based photodetectors are proposed.
  • Keywords
    elemental semiconductors; photodetectors; silicon; ultraviolet detectors; Si; silicon-based UV photodetector technologies; silicon-based ultraviolet photodetectors; wide-band gap semiconductors; Detectors; Optical surface waves; Photodiodes; Schottky diodes; Sensitivity; Silicon; Photodiode; responsivity; ultraviolet (UV) radiation;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2012.2192103
  • Filename
    6175098