DocumentCode :
1479562
Title :
Layer Number Determination and Thickness-Dependent Properties of Graphene Grown on SiC
Author :
Zhu, Wenjuan ; Dimitrakopoulos, Christos ; Freitag, Marcus ; Avouris, Phaedon
Author_Institution :
T.J. Watson Res. Center, IBM, Yorktown Heights, NY, USA
Volume :
10
Issue :
5
fYear :
2011
Firstpage :
1196
Lastpage :
1201
Abstract :
The electronic properties of few-layer graphene grown on the carbon face of silicon carbide (SiC) are found to be strongly dependent on the number of layers. The carrier mobility is larger in thicker graphene because substrate-related scattering is reduced in the higher layers. The carrier density dependence of the mobility is qualitatively different in thin and thick graphene, with the transition occurring at about 2 layers. The mobility increases with carrier density in thick graphene, similar to multilayer graphene exfoliated from natural graphite, suggesting that the individual layers are still electrically coupled in spite of reports recording non-Bernal stacking order in C-face grown graphene. The Hall coefficient peak value is reduced in thick graphene due to the increased density of states. A reliable and rapid characterization tool for the layer number is, therefore, highly desirable. To date, atomic force microscopy height determination and Raman scattering are typically used since the optical contrast of graphene on SiC is weak. However, both methods suffer from low throughput. We show that the scanning electron microscopy (SEM) contrast can give similar results with much higher throughput.
Keywords :
Hall effect; Raman spectra; atomic force microscopy; carrier density; carrier mobility; electronic density of states; elemental semiconductors; graphene; scanning electron microscopy; silicon compounds; C; Hall coefficient; Raman scattering; SiC; atomic force microscopy height determination; carrier density; density of states; graphene; layer number determination; nonBernal stacking order; optical contrast; scanning electron microscopy; silicon carbide; thickness-dependent properties; Charge carrier density; Epitaxial growth; Hall effect; Numerical analysis; Scattering; Silicon carbide; Substrates; Electrical properties; graphene; scanning electron microscopy (SEM); silicon carbide (SiC) substrate;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2011.2130536
Filename :
5738350
Link To Document :
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