Wall profile of thick photoresist generated via contact printing

Author

Cheng, Yao ; Lin, Ching-Yao ; Wei, Der-Hsin ; Loechel, Bernd ; Gruetzner, Gabi

Author_Institution

Synchrotron Radiat. Res. Center, Hsinchu, Taiwan

Volume

8

Issue

1

fYear

1999

fDate

3/1/1999 12:00:00 AM

Firstpage

18

Lastpage

26

Abstract

High-aspect-ratio patterns generated by direct contact or proximity printing in LIGA and other similar processes have recently gained great interest in the field of MEMS. One key issue for a successful thick-film lithography Is the control of wall profile. This paper deals with this issue based on an approximation including the effects of Fresnel diffraction and exposure kinetics for various types of photoresist. This approach leads to simple but practical formulas for estimating the wall profile and resolution for the near-field lithography of thick photoresist

Keywords

Fresnel diffraction; LIGA; micromechanical devices; photoresists; proximity effect (lithography); Fresnel diffraction; LIGA; MEMS; contact printing; exposure kinetics; high-aspect-ratio patterns; near-field lithography; photoresist; proximity printing; wall profile; Kinetic theory; Lithography; Micromechanical devices; Microstructure; Printing; Resists; Strontium; Synchrotrons; Thickness control; X-ray diffraction;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/84.749398

Filename

749398