DocumentCode :
1482195
Title :
A fully operational 1 kb variable threshold Josephson RAM
Author :
Kurosawa, Itaru ; Nakagawa, Hiroshi ; Aoyagi, Masahiro ; Kosaka, Shin ; Takada, Susumu
Author_Institution :
Electrotech. Lab., Ibaraki, Japan
Volume :
26
Issue :
4
fYear :
1991
fDate :
4/1/1991 12:00:00 AM
Firstpage :
572
Lastpage :
577
Abstract :
The first fully operational Josephson RAM in LSI level integration is described. The chip is designed as a 4 b× 256-word data RAM unit for a 4 b Josephson computer. A variable-threshold memory cell and the related memory architecture are used. They are so simple in structure that the fabrication can be accomplished using current Josephson junction technology. A directly coupled driver gate for a resistive bit line applies an accurate and stable driving current to the memory cell array. The RAM chip is fabricated with a 3 μm Nb/Al-oxide/Nb junction technology. For obtaining reliable RAM chips, a plasma-enhanced CVD (chemical-vapor-deposited) silicon dioxide layer is introduced for insulation between the ground plane and the base electrode. The thermal uniformity of the wafer is improved during the oxidation process for making a tunnel barrier. Installing this RAM chip together with a Josephson processor permitted the functions of a computer, including a memory access, to be successfully demonstrated. The access time was found to be 500-520 ps by measuring a test chip
Keywords :
Josephson effect; large scale integration; random-access storage; superconducting junction devices; superconducting memory circuits; 1 kbit; 3 micron; 4 bit; 500 to 520 ps; CVD SiO2 layer; Josephson RAM; Josephson computer; Josephson junction technology; LSI level integration; Nb-Al-AlOx-Nb junction; SiO2 insulation; access time; chemical-vapor-deposited; directly coupled driver gate; memory architecture; plasma-enhanced CVD; resistive bit line; superconducting IC; tunnel barrier; variable-threshold memory cell; Chemical technology; Fabrication; Josephson junctions; Large scale integration; Memory architecture; Niobium; Plasma chemistry; Random access memory; Read-write memory; Silicon on insulator technology;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.75057
Filename :
75057
Link To Document :
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