Title :
Soft magnetic properties and microstructures of FeRhN high moment thin films
Author :
Hong, Jongill ; Sin, Kyusik ; Nguyentran, Lee ; Wang, Shan X.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
fDate :
9/1/1997 12:00:00 AM
Abstract :
High moment FeRhN films with soft magnetic properties have been fabricated by reactive RF sputtering. The magnetic properties and microstructures of the FeRhN films are similar to those of FeN films, but the sputtering parameters for the minimum coercivity are somewhat shifted. The addition of Rh results in slightly increased saturation magnetostriction at a given N2/Ar flow rate ratio. It is confirmed by High Resolution Transmission Electron Microscopy (HREM) that small grains are important to obtain soft magnetic properties in FeRhN films deposited on alumina coated Al2O3-TiC (AlTiC) composite substrates. It is also observed that the grain size of the γ´-(FeRh)4N phase does not differ much from that of the α-(FeRhN) solid solution phase near the optimized N2/Ar flow rate ratio
Keywords :
coercive force; electron microscopy; ferromagnetic materials; grain size; iron compounds; magnetic moments; magnetic thin films; magnetostriction; rhenium compounds; soft magnetic materials; sputtered coatings; Al2O3-TiC composite substrate; FeRhN; FeRhN high moment thin film; HREM; coercivity; grain size; microstructure; reactive RF sputtering; saturation magnetostriction; soft magnetic properties; solid solution; Argon; Coercive force; Electrons; Magnetic films; Magnetic force microscopy; Magnetic properties; Magnetostriction; Microstructure; Radio frequency; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
