DocumentCode :
1482690
Title :
Influence of Periodic Patterning on the Magnetization Response of Micromagnetic Structures
Author :
Sang-Hyun Lim ; Wallis, T.M. ; Imtiaz, A. ; Dazhen Gu ; Krivosik, P. ; Kabos, P.
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
Volume :
2
fYear :
2011
fDate :
7/3/1905 12:00:00 AM
Firstpage :
3500104
Lastpage :
3500104
Abstract :
The magnetization response of single, patterned, thin-film Permalloy (Ni_80Fe_20, Py) elements embedded in a coplanar waveguide (CPW) is investigated. The anisotropic magnetoresistance (AMR) effect serves as the detection mechanism in current-modulated differential resistance (dV/ dI) and rectification effect measurements, which reveal magnetization dynamics over a broad frequency range. Differently shaped Py elements had distinctly different magnetization responses. In rectangular Py elements, the dynamic low frequency response shows two resonant excitations, whereas multimode ferromagnetic resonance (FMR) occurs in the high frequency range. Disk-shaped patterning significantly increases the magnetic loss in comparison to simple rectangular elements.
Keywords :
Permalloy; coplanar waveguides; enhanced magnetoresistance; ferromagnetic resonance; magnetic thin films; magnetisation; metallic thin films; micromagnetics; rectification; Ni80Fe20; anisotropic magnetoresistance effect; coplanar waveguide; current-modulated differential resistance; disk-shaped patterning; magnetic loss; magnetization dynamics; micromagnetic structure; multimode ferromagnetic resonance; periodic patterning; rectification effect; resonant excitation; single thin-film permalloy elements; Frequency measurement; Magnetic domains; Magnetic resonance; Magnetization; Perpendicular magnetic anisotropy; Magnetodynamics; anisotropic magnetoresistance (AMR); ferromagnetic resonance (FMR); spin rectification;
fLanguage :
English
Journal_Title :
Magnetics Letters, IEEE
Publisher :
ieee
ISSN :
1949-307X
Type :
jour
DOI :
10.1109/LMAG.2011.2119394
Filename :
5739675
Link To Document :
بازگشت