DocumentCode :
1483176
Title :
Monitoring hot-electron-induced degradation of floating-body SOI MOSFETs
Author :
Choi, Jin-young ; Sundaresan, Ravishankar ; Fossum, Jerry G.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
11
Issue :
4
fYear :
1990
fDate :
4/1/1990 12:00:00 AM
Firstpage :
156
Lastpage :
158
Abstract :
A simple model relating the hot-electron-controlled device lifetime of floating-body SOI MOSFETs to the body voltage is discussed. The model is derived from the familiar relationship between the device lifetime and the substrate current of bulk MOSFETs, a relationship that cannot be measured directly in floating-body MOSFETs. The model, which allows quick estimation of the device lifetime from body-voltage measurements, is supported by measurements of hot-electron-induced degradation of floating-body SOI MOSFETs fabricated using SIMOX substrates.<>
Keywords :
hot carriers; insulated gate field effect transistors; semiconductor device models; SIMOX substrates; Si; body-voltage measurements; floating-body SOI MOSFETs; hot-electron-controlled device lifetime; hot-electron-induced degradation; model; substrate current; CMOS technology; Current measurement; Degradation; Impact ionization; Integrated circuit measurements; Integrated circuit technology; MOSFETs; Monitoring; Semiconductor process modeling; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.61778
Filename :
61778
Link To Document :
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