DocumentCode :
1483528
Title :
Impact of Technology Scaling on the Heavy-Ion Upset Cross Section of Multi-Level Floating Gate Cells
Author :
Bagatin, Marta ; Gerardin, Simone ; Paccagnella, Alessandro ; Visconti, Angelo
Author_Institution :
Dipt. di Ing. dell´´Inf., Univ. di Padova, Padova, Italy
Volume :
58
Issue :
3
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
969
Lastpage :
974
Abstract :
The corruption of the information stored in floating gate cells due to heavy-ion strikes is a critical issue for the use of Flash memories in space. In this work we examine how feature size scaling affects the single event upset sensitivity of multi-level floating gate cells with NAND architecture. Both experimental data on heavy-ion irradiation and analytical modeling are used to study how the threshold LET and saturation cross section depend on the cell feature size. A comparison is also carried out between multi-level and single-level floating gate cells.
Keywords :
flash memories; radiation hardening (electronics); analytical modeling; feature size scaling; flash memories; heavy-ion irradiation; heavy-ion upset cross section; multilevel floating gate cells; saturation cross section; technology scaling; threshold LET; Bars; Data models; Flash memory; Radiation effects; Single event upset; Threshold voltage; Flash memories; heavy ions; radiation effects; single event upset;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2011.2122268
Filename :
5740382
Link To Document :
بازگشت