Title :
Optical metrology for MR heads
Author :
Kief, Mark T. ; Al-Jumaily, G. ; Mowry, Greg S.
Author_Institution :
Seagate Technol., Minneapolis, MN, USA
fDate :
9/1/1997 12:00:00 AM
Abstract :
The volume production of magnetoresistive heads requires fast and precise measurement of many critical material parameters such as film thickness and roughness. Optical metrology is ideally suited to perform these measurements. We review and demonstrate the application of Ellipsometry and Scatterometry for MR head metrology. We report results for NiFe film thickness measurements and Sendust surface roughness measurements with sub-Angstrom precision and repeatability
Keywords :
ellipsometry; light scattering; magnetic heads; magnetoresistive devices; surface topography measurement; thickness measurement; FeSiAl; NiFe; NiFe film thickness measurement; Sendust surface roughness measurement; ellipsometry; magnetoresistive head; optical metrology; scatterometry; volume production; Magnetic heads; Magnetic materials; Magnetoresistance; Metrology; Optical films; Optical materials; Optical scattering; Production; Thickness measurement; Volume measurement;
Journal_Title :
Magnetics, IEEE Transactions on
