DocumentCode
1483568
Title
Optical metrology for MR heads
Author
Kief, Mark T. ; Al-Jumaily, G. ; Mowry, Greg S.
Author_Institution
Seagate Technol., Minneapolis, MN, USA
Volume
33
Issue
5
fYear
1997
fDate
9/1/1997 12:00:00 AM
Firstpage
2926
Lastpage
2928
Abstract
The volume production of magnetoresistive heads requires fast and precise measurement of many critical material parameters such as film thickness and roughness. Optical metrology is ideally suited to perform these measurements. We review and demonstrate the application of Ellipsometry and Scatterometry for MR head metrology. We report results for NiFe film thickness measurements and Sendust surface roughness measurements with sub-Angstrom precision and repeatability
Keywords
ellipsometry; light scattering; magnetic heads; magnetoresistive devices; surface topography measurement; thickness measurement; FeSiAl; NiFe; NiFe film thickness measurement; Sendust surface roughness measurement; ellipsometry; magnetoresistive head; optical metrology; scatterometry; volume production; Magnetic heads; Magnetic materials; Magnetoresistance; Metrology; Optical films; Optical materials; Optical scattering; Production; Thickness measurement; Volume measurement;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.617800
Filename
617800
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