DocumentCode :
1484018
Title :
Cener for advanced electronic materials processing
Author :
Masnari, Nino A. ; Hauser, John R. ; Lucovsky, Gerald ; Maher, Dennis M. ; Markunas, Robert J. ; Özturk, Mehmet C. ; Wortman, Jimmie J.
Author_Institution :
North Carolina State University
Volume :
81
Issue :
1
fYear :
1993
fDate :
1/1/1993 12:00:00 AM
Firstpage :
42
Lastpage :
59
Keywords :
Dielectric thin films; Integrated circuit manufacture; Integrated circuit technology; Materials processing; Materials science and technology; Microelectronics; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Plasma temperature;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/JPROC.1993.752025
Filename :
752025
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1484018
