DocumentCode :
1484271
Title :
A Broadband 900-GHz Silicon Micromachined Two-Anode Frequency Tripler
Author :
Li, Yuan ; Mehdi, Imran ; Maestrini, Alain ; Lin, Robert H. ; Papapolymerou, John
Volume :
59
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
1673
Lastpage :
1681
Abstract :
The design, fabrication, and measurement are presented for a 900-GHz frequency tripler with silicon micromachined blocks made using deep reactive ion etching. The broadband design results in more than 60 μW between 877.5-922.5 GHz and the peak output power of 85.3 μW in the frequency response, all measured at room temperature. In power sweep measurement, the tripler delivers the maximum power of 109.3 μW at 909 GHz. This is the first demonstration of a frequency tripler using silicon micromachining at these frequencies and suggests that this technology is a viable option for receiver arrays in the terahertz frequency range.
Keywords :
elemental semiconductors; frequency multipliers; frequency response; micromachining; power measurement; silicon; sputter etching; submillimetre wave measurement; Si; broadband silicon micromachined two-anode frequency tripler; deep reactive ion etching; frequency 877.5 GHz to 922.5 GHz; frequency response; power 109.3 muW; power 85.3 muW; power sweep measurement; receiver array; temperature 293 K to 298 K; terahertz frequency range; Broadband communication; Laser beams; Micromachining; Probes; Schottky diodes; Silicon; Waveguide components; Balanced diodes; Schottky diode; frequency multiplier; micromachining; submillimeter wave;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2011.2123112
Filename :
5740622
Link To Document :
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