DocumentCode :
1484408
Title :
Introduction to the Special Section on Advanced Process Control
Author :
Moyne, James ; Patel, Nital S.
Author_Institution :
Applied Materials Inc., Canton, MI, USA
Volume :
23
Issue :
2
fYear :
2010
fDate :
5/1/2010 12:00:00 AM
Firstpage :
149
Lastpage :
150
Abstract :
The nine papers selected for the current special section reflect the continued maturation of advanced process control (APC) research and its movement into new application and technology areas.
Keywords :
Control systems; Fault detection; Metrology; Optimization methods; Process control; Productivity; Sampling methods; Semiconductor process modeling; Size control; Special issues and sections;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2010.2046115
Filename :
5458323
Link To Document :
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