DocumentCode :
1485410
Title :
A Microstructure For Measurement Of Thermal Conductivity Of Polysilicon Thin Films
Author :
Völklein, Friedemann ; Balles, H.
Author_Institution :
Quantum Electronics
Volume :
1
Issue :
4
fYear :
1992
fDate :
12/1/1992 12:00:00 AM
Firstpage :
193
Lastpage :
196
Keywords :
CMOS integrated circuits; CMOS process; CMOS technology; Conductive films; Conductivity measurement; Etching; Microstructure; Silicon; Thermal conductivity; Transistors;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.1992.752511
Filename :
752511
Link To Document :
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