Title :
Enhanced Extraction Efficiency of InGaN/GaN Light-Emitting Diodes by Liquid Phase-Deposited Zinc-Oxide-Textured Window Layer
Author :
Lei, Po-Hsun ; Lee, Yuan-Chih ; Lin, Chia-Te
Author_Institution :
Grad. Inst. of Electro-Opt. & Mater. Sci., Nat. Formosa Univ., Yunlin, Taiwan
fDate :
6/1/2012 12:00:00 AM
Abstract :
This paper proposes a method of improving the extraction efficiency of InGaN/GaN light-emitting diodes (LEDs) using textured zinc oxide (ZnO) prepared by liquid phase deposition (LPD). The treatment solution for liquid-phase-deposited ZnO (LPD-ZnO) consisted of hydrochloric acid (HCl) saturated with ZnO powder. The deposition temperature was maintained at 30 °C using a temperature-controlled water bath system. Atomic force microscope images of the LPD-ZnO indicate that the root-mean-square (RMS) roughness of the LPD-ZnO is dependent on the HCl concentration. As compared with conventional the InGaN/GaN LED, the extraction efficiency of the InGaN/GaN LED with the LPD-ZnO-textured layer increases in conjunction with RMS roughness. The maximum light output intensity enhancement of 48% for the InGaN/GaN LED with an RMS roughness of 16.26 nm occurred under a driving current of 20 mA. The calculated optical intensity of the InGaN/GaN LED with a bumplike LPD-ZnO-textured surface indicates that the optimum RMS roughness of the textured surface layer applied to InGaN/GaN LEDs is approximately 16 nm, which agrees with the experimental results. The InGaN/GaN LED with LPD-ZnO with an RMS roughness of 16.26 nm shows a wide light output divergence angle, which satisfies the requirement of the applications of a backlight source.
Keywords :
II-VI semiconductors; III-V semiconductors; atomic force microscopy; gallium compounds; indium compounds; light emitting diodes; liquid phase deposition; surface roughness; wide band gap semiconductors; HCl; InGaN-GaN; LED; LPD-textured surface layer; RMS roughness; atomic force microscope images; enhanced extraction efficiency; hydrochloric acid; light-emitting diodes; liquid phase-deposited zinc-oxide-textured window layer; root-mean-square roughness; size 16.26 nm; temperature 30 degC; temperature-controlled water bath system; Gallium nitride; Light emitting diodes; Rough surfaces; Surface morphology; Surface roughness; Surface texture; Zinc oxide; InGaN/GaN light-emitting diodes (LEDs); liquid-phase-deposition (LPD) method; textured window layer; zinc oxide (ZnO);
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2012.2189215