DocumentCode
1485776
Title
Physics-Based Band Gap Model for Relaxed and Strained [100] Silicon Nanowires
Author
Ghosh, Ram Krishna ; Bhattacharya, Sitangshu ; Mahapatra, Santanu
Author_Institution
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume
59
Issue
6
fYear
2012
fDate
6/1/2012 12:00:00 AM
Firstpage
1765
Lastpage
1772
Abstract
In this paper, we propose a physics-based simplified analytical model of the energy band gap and electron effective mass in a relaxed and strained rectangular [100] silicon nanowires (SiNWs). Our proposed formulation is based on the effective mass approximation for the nondegenerate two-band model and 4 × 4 Lüttinger Hamiltonian for energy dispersion relation of conduction band electrons and the valence band heavy and light holes, respectively. Using this, we demonstrate the effect of the uniaxial strain applied along [100]-direction and a biaxial strain, which is assumed to be decomposed from a hydrostatic deformation along [001] followed by a uniaxial one along the [100]-direction, respectively, on both the band gap and the transport and subband electron effective masses in SiNW. Our analytical model is in good agreement with the extracted data using the extended-Hückel-method-based numerical simulations over a wide range of device dimensions and applied strain.
Keywords
deformation; electrons; elemental semiconductors; hydrostatics; nanowires; numerical analysis; silicon; Lüttinger Hamiltonian; Si; biaxial strain; conduction band electron; effective mass approximation; electron effective mass; energy band gap; energy dispersion relation; extended-Hückel-method-based numerical simulation; hydrostatic deformation; nondegenerate two-band model; physics-based band gap model; physics-based simplified analytical model; relaxed nanowire; strained nanowire; uniaxial strain effect; valence band heavy hole; valence band light hole; Analytical models; Dispersion; Effective mass; Photonic band gap; Silicon; Strain; Wires; Band gap; effective mass; nanowires; size quantization; strain;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2190737
Filename
6178787
Link To Document