Title :
The influence of deposition conditions on the magnetic properties in PtMnSb films
Author :
Ohnuma, S. ; Kunimoto, A. ; Masumoto, T.
Author_Institution :
Res. Inst. of Electr. & Magnetic Alloys, Sendai, Japan
fDate :
11/1/1988 12:00:00 AM
Abstract :
The dependence of magnetic properties on preparation conditions and annealing temperature of PtMnSb intermetallic compound has been investigated. Samples were prepared by sputter deposition on an SiO2 substrate under different sputtering conditions. Magnetic properties of as-deposited films were strongly related to argon sputter gas pressure (PAr) and substrate temperature during sputtering. The anisotropy changes from parallel to perpendicular to the substrate plane PAr=30 mTorr and coercivity as high as 400 Oe was obtained at 40 mTorr. Annealing over 350°C led to an increase in Θk for all samples. Ku⊥ of 2×104 erg/cm3 and Hc⊥ of 800 Oe were obtained by annealing at 450°C for the films deposited over about PAr=20 mTorr. The angular dependence of Hc for these samples is fairly large and qualitatively in agreement with simple Stoner-Wohlfarth behavior. Scanning electron microscope (SEM) observation clarified that such films are composed of PtMnSb columns, which behave like single-domain particles
Keywords :
antimony alloys; coercive force; magnetic anisotropy; magnetic thin films; magneto-optical recording; manganese alloys; platinum alloys; scanning electron microscope examination of materials; sputter deposition; 0 to 40 mtorr; 350 to 450 C; Ar sputter gas; PtMnSb films; RF sputtering; SEM; SiO2 substrate; Stoner-Wohlfarth behavior; anisotropy; annealing temperature; as-deposited films; coercivity; columns; deposition conditions; intermetallic compound; magnetic properties; perpendicular recording magneto optical recording media; preparation conditions; single-domain particles; sputter deposition; sputtering conditions; substrate temperature; Anisotropic magnetoresistance; Annealing; Argon; Coercive force; Intermetallic; Magnetic films; Magnetic properties; Scanning electron microscopy; Sputtering; Temperature dependence;
Journal_Title :
Magnetics, IEEE Transactions on
