Title :
Study on magneto-optical TbFeCo thin films magnetron-sputtered from targets with low and high magnetic permeabilities
Author :
Ahn, Y.M. ; Cho, B.I. ; Ro, M.D. ; Yoon, D.S. ; Gill, B.L. ; Ahn, T.H.
Author_Institution :
DVD R&D Team, Samsung Electron. Co. Ltd., Kyungki, South Korea
fDate :
9/1/1997 12:00:00 AM
Abstract :
We investigated the influence of the magnetic permeabilities of the magneto-optical (MO) tertiary TbFeCo targets. Films were sputter-deposited by using a magnetron rf-dc sputtering system. Target B with a low magnetic permeability (5) was found favorable with regard to the target use efficiency (35%), and the uniform film thickness in the range of 1975 Å to 2015 Å over a substrate of 130 mn in diameter, compared to Target A with a high magnetic permeability (40). The difference of the Tb content between the sputtered thin films and Target B was found narrower than that of the Tb content between the sputtered thin films and Target A. A low motor current was needed to rotate the magnet placed below Target B during the magnetron-sputtering
Keywords :
Kerr magneto-optical effect; cobalt alloys; coercive force; ferrimagnetic materials; iron alloys; magnetic leakage; magnetic permeability; magnetic thin films; magneto-optical recording; sputter deposition; sputtered coatings; terbium alloys; 1975 to 2015 angstrom; 35 percent; Kerr rotation angle; Tb content; TbFeCo; coercivity; leakage magnetic flux; low motor current; magnet rotation; magnetic permeabilities; magneto-optical TbFeCo thin films; magnetron rf-dc sputtering system; target use efficiency; uniform film thickness; Chemicals; Coercive force; DVD; Intermetallic; Magnetic films; Magnetic flux; Permeability; Research and development; Sputtering; Substrates; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
