DocumentCode :
1486895
Title :
Effect of interface roughness and polarisation on the optical losses of porous silicon-based waveguides
Author :
Charrier, Jean-Philippe ; Dumeige, Yannick ; Pirasteh, P. ; Gadonna, M.
Author_Institution :
FOTON, Univ. Eur. de Bretagne, Lannion, France
Volume :
7
Issue :
3
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
275
Lastpage :
278
Abstract :
Optical losses measurements were performed at 1550 nm on both porous silicon (PSi) and oxidised PSi (OPSi) planar waveguides as a function of interface roughness. The PSi waveguides were produced at different anodisation temperatures to reduce the interface roughness. The authors noticed a decrease in optical losses with the diminution of roughness. The lowest value of optical losses was equal to 0.5 dB/cm and obtained for OPSi waveguide with a 10 nm interface roughness and anodisation temperature equal to 20 C. The surface scattering losses were modelled. There is a good agreement between the theoretical and experimental values. The optical losses were also carried out in transverse electric (TE) and transverse magnetic (TM) polarisations for both PSi and oxidised OPSi waveguides.
Keywords :
anodisation; light polarisation; optical losses; optical planar waveguides; anodisation temperatures; interface roughness; optical losses measurements; porous silicon-based planar waveguides; surface scattering losses; transverse electric polarisations; transverse magnetic polarisations; wavelength 1550 nm;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2012.0027
Filename :
6179261
Link To Document :
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