DocumentCode :
1487716
Title :
Sensitive stress-impedance micro sensor using amorphous magnetostrictive wire
Author :
Shen, L.P. ; Uchiyama, T. ; Mohri, K. ; Kita, E. ; Bushida, K.
Author_Institution :
Dept. of Electr. Eng., Nagoya Univ., Japan
Volume :
33
Issue :
5
fYear :
1997
fDate :
9/1/1997 12:00:00 AM
Firstpage :
3355
Lastpage :
3357
Abstract :
A giant stress-impedance (GSI) effect with the strain-gauge factor more than 1200 was found in negative magnetostrictive amorphous CoSiB wires of 30-μm diameter magnetized with a high frequency current or a sharp pulse current. A sensitive stress sensor is constructed using a CMOS IC multivibrator circuit in which the amorphous wire is magnetized with a sharp pulse train current. The amorphous wire GSI sensor will be applied for detection of such as pressure, tension, stream speed for liquid and gases and mechano-cardiogram with the sensitivity of 5-6 times higher than that of the semiconductor stress sensors utilizing the piezo-resistance effect showing a gauge factor of about 200
Keywords :
amorphous magnetic materials; boron alloys; cobalt alloys; magnetic sensors; magnetostrictive devices; microsensors; silicon alloys; strain gauges; stress measurement; CMOS IC multivibrator circuit; CoSiB; GSI microsensor; amorphous magnetostrictive wire; giant stress impedance; high frequency current; pulse train current; strain gauge factor; stress sensor; Amorphous magnetic materials; Amorphous materials; CMOS integrated circuits; Frequency; Magnetic circuits; Magnetic semiconductors; Magnetic sensors; Magnetostriction; Stress; Wire;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.617942
Filename :
617942
Link To Document :
بازگشت