DocumentCode :
1488451
Title :
Fabrication of Flexible Amorphous-Si Thin-Film Solar Cells on a Parylene Template Using a Direct Separation Process
Author :
Lo, Shih-Yung ; Wuu, Dong-Sing ; Chang, Chia-Hao ; Wang, Chao-Chun ; Lien, Shui-Yang ; Horng, Ray-Hua
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chung Hsing Univ., Taichung, Taiwan
Volume :
58
Issue :
5
fYear :
2011
fDate :
5/1/2011 12:00:00 AM
Firstpage :
1433
Lastpage :
1439
Abstract :
In this paper, we report on the fabrication of flexible amorphous-silicon (a-Si) thin-film solar cells on a parylene template carried by a glass plate without any adhesive. The a-Si thin-film solar cells could be separated directly from the glass carrier after a process temperature of up to 200°C. The a-Si and parylene films were deposited using high-frequency plasma-enhanced chemical vapor deposition and a parylene reactor. The parylene-coated glass plate was treated with thermal annealing and Ar, N2, or O2 plasma. Moreover, SiNx and/or SiOx films were used as barrier layers between the transparent conductive oxide and parylene films. Details of different gas plasmas and barrier effects were investigated in terms of surface morphologies and solar cell characteristics. The a-Si thin-film solar cell on a parylene template with an open-circuit voltage of 0.74 V, a short-circuit current density of 15.69 mA/cm2, a fill factor of 54.98%, and a conversion efficiency of 5.78 % could be obtained. After the 10-mm-radius bending test for 5000 times, the a-Si thin-film solar cells still exhibited a conversion efficiency of 4.94%. These results indicated that a-Si thin-film solar cells on parylene templates have high potential for flexible photovoltaic applications.
Keywords :
amorphous semiconductors; chemical vapour deposition; elemental semiconductors; silicon; solar cells; thin films; Si; direct separation process; flexible amorphous-silicon thin-film solar cells fabrication; glass plate; high-frequency plasma-enhanced chemical vapor deposition; open-circuit voltage; parylene films; parylene reactor; parylene template; short-circuit current density; size 10 mm; temperature 200 C; transparent conductive oxide; voltage 0.74 V; Glass; Photovoltaic cells; Plasmas; Rough surfaces; Substrates; Surface roughness; Surface treatment; Amorphous silicon (a-Si); direct separation; flexible; parylene; solar cell;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2116793
Filename :
5742692
Link To Document :
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