DocumentCode
1488723
Title
Overview of Ionizing Radiation Effects in Image Sensors Fabricated in a Deep-Submicrometer CMOS Imaging Technology
Author
Goiffon, Vincent ; Estribeau, Magali ; Magnan, Pierre
Author_Institution
Super. de l´´Aeronautique et de l´´Espace, Univ. de Toulouse, Toulouse, France
Volume
56
Issue
11
fYear
2009
Firstpage
2594
Lastpage
2601
Abstract
An overview of ionizing radiation effects in imagers manufactured in a 0.18-mum CMOS image sensor technology is presented. Fourteen types of image sensors are characterized and irradiated by a 60Co source up to 5 kGy. The differences between these 14 designs allow us to separately estimate the effect of ionizing radiation on microlenses, on low- and zero-threshold-voltage MOSFETs and on several pixel layouts using P+ guard-rings and edgeless transistors. After irradiation, wavelength dependent responsivity drops are observed. All the sensors exhibit a large dark current increase attributed to the shallow trench isolation that surrounds the photodiodes. Saturation voltage rises and readout chain gain variations are also reported. Finally, the radiation hardening perspectives resulting from this paper are discussed.
Keywords
CMOS image sensors; MOSFET; CMOS image sensor; deep-submicrometer CMOS imaging; edgeless transistors; ionizing radiation effects; zero-threshold-voltage MOSFET; CMOS image sensors; CMOS technology; Image sensors; Ionizing radiation; Ionizing radiation sensors; Lenses; MOSFETs; Manufacturing; Microoptics; Sensor phenomena and characterization; Active pixel sensors (APSs); CMOS image sensors (CISs); dark current; ionizing radiation; microlenses; quantum efficiency; radiation hardening by design; responsivity; total dose;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2009.2030623
Filename
5272218
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