• DocumentCode
    1488723
  • Title

    Overview of Ionizing Radiation Effects in Image Sensors Fabricated in a Deep-Submicrometer CMOS Imaging Technology

  • Author

    Goiffon, Vincent ; Estribeau, Magali ; Magnan, Pierre

  • Author_Institution
    Super. de l´´Aeronautique et de l´´Espace, Univ. de Toulouse, Toulouse, France
  • Volume
    56
  • Issue
    11
  • fYear
    2009
  • Firstpage
    2594
  • Lastpage
    2601
  • Abstract
    An overview of ionizing radiation effects in imagers manufactured in a 0.18-mum CMOS image sensor technology is presented. Fourteen types of image sensors are characterized and irradiated by a 60Co source up to 5 kGy. The differences between these 14 designs allow us to separately estimate the effect of ionizing radiation on microlenses, on low- and zero-threshold-voltage MOSFETs and on several pixel layouts using P+ guard-rings and edgeless transistors. After irradiation, wavelength dependent responsivity drops are observed. All the sensors exhibit a large dark current increase attributed to the shallow trench isolation that surrounds the photodiodes. Saturation voltage rises and readout chain gain variations are also reported. Finally, the radiation hardening perspectives resulting from this paper are discussed.
  • Keywords
    CMOS image sensors; MOSFET; CMOS image sensor; deep-submicrometer CMOS imaging; edgeless transistors; ionizing radiation effects; zero-threshold-voltage MOSFET; CMOS image sensors; CMOS technology; Image sensors; Ionizing radiation; Ionizing radiation sensors; Lenses; MOSFETs; Manufacturing; Microoptics; Sensor phenomena and characterization; Active pixel sensors (APSs); CMOS image sensors (CISs); dark current; ionizing radiation; microlenses; quantum efficiency; radiation hardening by design; responsivity; total dose;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2009.2030623
  • Filename
    5272218