Title :
Reliability evaluation of bonding between Cu wire and Al pad
Author :
Ishida, Yuuki ; Ota, Naoki ; Yamashita, Shinji
Author_Institution :
Quality Assurance Div., YASKAWA Electr. Corp., Fukuoka, Japan
Abstract :
There are several reliability problems, while Cu wire bonding has been used instead of Au wire bonding in microelectronics packaging. A previous work indicated that after autoclave test maintaining at 394 K, 100% relative humidity and 0.2 MPa for 300 h, a maximum shear strength of Cu wire bonding was decreased to about half that of initial Cu. In this work, we study the reason for decrease in a maximum shear strength. From quantification I method which is one of multivariate analyses, it was found that the value of pH in the molding compound has a significant effect on the decrease in a maximum shear strength. Furthermore, Cu wire bonding to Al pad molded by higher hydrogen index (pH=5.8) compound is higher reliability than that by lower hydrogen index (pH=5.1) compound. From SEM, TEM and EDX observation, it is found that oxides are formed in Cu-Al alloy layer between Cu wire and Al pad in specimen having lower pH. It is because that lower pH atmosphere in molding compound during autoclave test enabled Cu-Al alloy to corrode. As a result, these oxides reduced the shear strength of bonding between Cu wire and Al pad.
Keywords :
aluminium alloys; copper alloys; electronics packaging; lead bonding; reliability; shear strength; Al; Cu; maximum shear strength; microelectronics packaging; reliability evaluation; wire bonding; Bonding; Compounds; Metals; Reliability; Scanning electron microscopy; Stress; Wires; intermetallic compound; molding compound; multivariate analysis; pH; shear strengtht;
Conference_Titel :
Electronics Packaging (ICEP), 2014 International Conference on
Conference_Location :
Toyama
Print_ISBN :
978-4-904090-10-7
DOI :
10.1109/ICEP.2014.6826756