Title :
A Crystalline Metallic Copper Network Application Film Produced by High-Temperature Atmospheric Sintering
Author :
Kato, Takahiko ; Adachi, Shuichiro ; Aoyagi, Takuya ; Naito, Takashi ; Yamamoto, Hiroki ; Nojiri, Takeshi ; Yoshida, Masato
Abstract :
We show the first production of a copper (Cu) application film (AF) consisting of a novel network of crystalline metallic Cu embedded with copper-phosphorus-oxygen glasses (Cu 2(PO4) and Cu 2P2O 7) to provide new feedstock materials for crystalline silicon (Si) photovoltaics (PVs). The Cu crystal network was preferentially grown in AF, and thus, a Cu AF with low-electrical resistivity was formed in air at elevated temperatures of ≥ 450°C by using a copper-phosphorus (Cu-P) alloy paste as a starting material for the sintering. The Cu-P alloy had the role that governed deoxidization of a cuprous oxide, which was formed on heating during the sintering, by virtue of a concurrent oxidation of the Cu phosphide at elevated temperatures. Our results may open the way to the widespread use of atmospherically sintered Cu AFs for mass-production of next-generation crystalline Si PVs.
Keywords :
copper; copper compounds; electrical resistivity; glass; metallic thin films; oxidation; sintering; Cu-Cu2(PO4); Cu-Cu2P2O7; copper-phosphorus alloy paste; copper-phosphorus-oxygen glasses; crystalline metallic copper network application film; crystalline silicon photovoltaics; deoxidization; electrical resistivity; feedstock materials; high-temperature atmospheric sintering; Contacts; Copper; Crystalline materials; Materials preparation; Silicon; Atmospheric sintering; copper–phosphorus (Cu–P) alloy paste; crystalline metallic copper application film; crystalline silicon (Si) photovoltaic (PVs) contacts;
Journal_Title :
Photovoltaics, IEEE Journal of
DOI :
10.1109/JPHOTOV.2012.2188018