Title :
Highly efficient enhancement-mode power heterojunction FET with multilayer cap and doped recess structure for 3.5-V digital cellular phones
Author :
Bite, Y. ; Iwata, N.
Author_Institution :
Kansai Electron. Res. Labs., NEC Corp., Shiga, Japan
fDate :
4/1/1999 12:00:00 AM
Abstract :
This paper describes the highly efficient 950-MHz power performance of an enhancement-mode double-doped AlGaAs/InGaAs/AlGaAs heterojunction FET (HJFET) under 3.5-V operation for personal digital cellular (PDC) phones. The device has a multilayer cap and a double recess structure in which a highly doped GaAs layer is employed beneath a wide recess for reducing on-resistance (R/sub 0n/) and increasing maximum drain current (Imax). A developed device exhibited 1.6 /spl Omega//spl middot/mm R0n and 400 mA/mm Imax with a threshold voltage of +0.18 V. Under single 3.5-V operation, the 24-mm HJFET, with less than 50 μA drain current at a gate-to-source voltage of 0.0 V, exhibited 1.15 W output power and 67.6% power-added efficiency (PAE) with an adjacent channel leakage power of -48.4 dBc at 50 kHz off-center frequency.
Keywords :
III-V semiconductors; UHF field effect transistors; aluminium compounds; cellular radio; gallium arsenide; indium compounds; leakage currents; power field effect transistors; 0.18 V; 1.15 W; 3.5 V; 50 kHz; 67.6 percent; 950 MHz; AlGaAs-InGaAs-AlGaAs; III-V semiconductors; adjacent channel leakage power; doped recess structure; enhancement-mode power heterojunction FET; gate-to-source voltage; maximum drain current; multilayer cap; off-center frequency; on-resistance; output power; personal digital cellular phones; power-added efficiency; threshold voltage; Cellular phones; Dry etching; FETs; Gallium arsenide; Heterojunctions; Indium gallium arsenide; Leakage current; Nonhomogeneous media; Switches; Threshold voltage;
Journal_Title :
Electron Device Letters, IEEE