DocumentCode
1489509
Title
On Backscattering and Mobility in Nanoscale Silicon MOSFETs
Author
Jeong, Changwook ; Antoniadis, Dimitri A. ; Lundstrom, Mark S.
Author_Institution
Network for Comput. Nanotechnol., Purdue Univ., West Lafayette, IN, USA
Volume
56
Issue
11
fYear
2009
Firstpage
2762
Lastpage
2769
Abstract
The DC current-voltage characteristics of an n-channel silicon MOSFET with an effective gate length of about 60 nm are analyzed and interpreted in terms of scattering theory. The experimental results are found to be consistent with the predictions of scattering theory - the drain current is closer to the ballistic limit under high drain bias than under low drain bias, and the on-current in strong inversion is limited by a small portion of the channel near the source. The question of how the low- and high- V DS drain currents are related to the near-equilibrium, long-channel mobility is also addressed. In the process of this analysis, theoretical and experimental uncertainties that make it difficult to extract numerically precise values of the scattering parameters are identified.
Keywords
MOSFET; S-parameters; backscatter; DC current-voltage characteristics; drain current; long-channel mobility; n-channel silicon MOSFET; nanoscale silicon MOSFET; scattering parameters; scattering theory; Analytical models; Backscatter; MOSFETs; Nanotechnology; Numerical models; Particle scattering; Quantum capacitance; Scattering parameters; Silicon; Uncertainty; Backscattering coefficient; MOSFETs; mean free path; mobility;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2009.2030844
Filename
5272458
Link To Document