• DocumentCode
    1489509
  • Title

    On Backscattering and Mobility in Nanoscale Silicon MOSFETs

  • Author

    Jeong, Changwook ; Antoniadis, Dimitri A. ; Lundstrom, Mark S.

  • Author_Institution
    Network for Comput. Nanotechnol., Purdue Univ., West Lafayette, IN, USA
  • Volume
    56
  • Issue
    11
  • fYear
    2009
  • Firstpage
    2762
  • Lastpage
    2769
  • Abstract
    The DC current-voltage characteristics of an n-channel silicon MOSFET with an effective gate length of about 60 nm are analyzed and interpreted in terms of scattering theory. The experimental results are found to be consistent with the predictions of scattering theory - the drain current is closer to the ballistic limit under high drain bias than under low drain bias, and the on-current in strong inversion is limited by a small portion of the channel near the source. The question of how the low- and high- V DS drain currents are related to the near-equilibrium, long-channel mobility is also addressed. In the process of this analysis, theoretical and experimental uncertainties that make it difficult to extract numerically precise values of the scattering parameters are identified.
  • Keywords
    MOSFET; S-parameters; backscatter; DC current-voltage characteristics; drain current; long-channel mobility; n-channel silicon MOSFET; nanoscale silicon MOSFET; scattering parameters; scattering theory; Analytical models; Backscatter; MOSFETs; Nanotechnology; Numerical models; Particle scattering; Quantum capacitance; Scattering parameters; Silicon; Uncertainty; Backscattering coefficient; MOSFETs; mean free path; mobility;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2009.2030844
  • Filename
    5272458