Physical and electro-chemical properties of high rate ion-beam sputtered Fe films

Author

Lo, Jerry ; Franco, L. ; Huang, T.C. ; Wu, T.W. ; Miller, D. ; Campbell, R.

Volume

24

Issue

6

fYear

1988

fDate

11/1/1988 12:00:00 AM

Firstpage

3081

Lastpage

3083

Abstract

Magnetic properties, resistivity, hardness, and corrosion resistance of nitrogen-doped iron films deposited using an ion-beam sputter system are reported. It was found that longer ion source idling time and higher nitrogen doping generates films with lower coercivities, lower anisotropy fields, and finer grain size for nitrogen concentration less than 3 at.%. The nitrogen in the films is chemically bonded to iron with photoelectron binding energy of 397.2 eV. For nitrogen concentrations ⩾5 at.%, near-zero saturation magnetostriction, fine grain size, high saturation magnetization, 60 μΩ-cm resistivity, 20 GPa hardness, and corrosion resistance higher than that of NiFe were obtained

Keywords

coercive force; corrosion; electronic conduction in metallic thin films; ferromagnetic properties of substances; hardness; iron; magnetic anisotropy; magnetic thin films; magnetostriction; nitrogen; sputtered coatings; Fe:N films; anisotropy fields; coercivities; corrosion resistance; grain size; hardness; ion source idling time; ion-beam sputter system; photoelectron binding energy; resistivity; saturation magnetization; saturation magnetostriction; Coercive force; Conductivity; Corrosion; Doping; Grain size; Ion sources; Iron; Magnetic films; Magnetic properties; Nitrogen;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.92341

Filename

92341