DocumentCode :
1491701
Title :
A novel self-aligned fabrication process for nickel-indiffused lithium niobate ridge optical waveguides
Author :
Chang, Wen-Ching ; Sue, Chao-Yung ; Hou, Hung-Ching ; Chang, Shih-Jung ; Wei, Pei-Kuen
Author_Institution :
Dept. of Electr. Eng., Tamkang Univ., Tamsui, Taiwan
Volume :
17
Issue :
4
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
613
Lastpage :
620
Abstract :
A novel self-aligned fabrication process for LiNbO3:Ni ridge waveguides has been proposed. By using the self-aligned trilayered structure composed of Ni-Ti-Si, the fabrication process is significantly simplified, and takes advantage of suppression of the unwanted planar waveguides and high-coupling efficiency to a single-mode fiber as compared to the conventional processes. Detailed investigations into the characteristics of the ridge waveguides have also proved to be informative under different fabrication parameters. Moreover, the novel self-aligned fabrication process was applied to fabricate a ridge waveguide Mach-Zehnder modulator. The measured half-wave voltage and extinction ratio mere 20.5 V and 12 dB (@1.3 μm), and were 4.2 V and 8 dB (@0.6328 £gm)
Keywords :
chemical interdiffusion; electro-optical modulation; lithium compounds; nickel; optical couplers; optical fabrication; optical planar waveguides; ridge waveguides; 20.5 V; 4.2 V; LiNbO3:Ni; LiNbO3:Ni ridge waveguides; Ni-Ti-Si; extinction ratio; fabrication parameters; high-coupling efficiency; measured half-wave voltage; nickel-indiffused lithium niobate ridge optical waveguides; optical couplers; ridge waveguide Mach-Zehnder modulator; ridge waveguides; self-aligned fabrication process; self-aligned trilayered structure; single-mode fiber coupling; unwanted planar waveguides; Dry etching; High speed optical techniques; Integrated optics; Lithium niobate; Nickel; Optical device fabrication; Optical modulation; Optical waveguides; Stimulated emission; Wet etching;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.754791
Filename :
754791
Link To Document :
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