• DocumentCode
    1491701
  • Title

    A novel self-aligned fabrication process for nickel-indiffused lithium niobate ridge optical waveguides

  • Author

    Chang, Wen-Ching ; Sue, Chao-Yung ; Hou, Hung-Ching ; Chang, Shih-Jung ; Wei, Pei-Kuen

  • Author_Institution
    Dept. of Electr. Eng., Tamkang Univ., Tamsui, Taiwan
  • Volume
    17
  • Issue
    4
  • fYear
    1999
  • fDate
    4/1/1999 12:00:00 AM
  • Firstpage
    613
  • Lastpage
    620
  • Abstract
    A novel self-aligned fabrication process for LiNbO3:Ni ridge waveguides has been proposed. By using the self-aligned trilayered structure composed of Ni-Ti-Si, the fabrication process is significantly simplified, and takes advantage of suppression of the unwanted planar waveguides and high-coupling efficiency to a single-mode fiber as compared to the conventional processes. Detailed investigations into the characteristics of the ridge waveguides have also proved to be informative under different fabrication parameters. Moreover, the novel self-aligned fabrication process was applied to fabricate a ridge waveguide Mach-Zehnder modulator. The measured half-wave voltage and extinction ratio mere 20.5 V and 12 dB (@1.3 μm), and were 4.2 V and 8 dB (@0.6328 £gm)
  • Keywords
    chemical interdiffusion; electro-optical modulation; lithium compounds; nickel; optical couplers; optical fabrication; optical planar waveguides; ridge waveguides; 20.5 V; 4.2 V; LiNbO3:Ni; LiNbO3:Ni ridge waveguides; Ni-Ti-Si; extinction ratio; fabrication parameters; high-coupling efficiency; measured half-wave voltage; nickel-indiffused lithium niobate ridge optical waveguides; optical couplers; ridge waveguide Mach-Zehnder modulator; ridge waveguides; self-aligned fabrication process; self-aligned trilayered structure; single-mode fiber coupling; unwanted planar waveguides; Dry etching; High speed optical techniques; Integrated optics; Lithium niobate; Nickel; Optical device fabrication; Optical modulation; Optical waveguides; Stimulated emission; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/50.754791
  • Filename
    754791