DocumentCode :
1492365
Title :
Study of the relation between doping profile and diode CV characteristics
Author :
Salameh, Daoud ; Linton, David
Author_Institution :
Dept. of Electr. & Electron. Eng., Queen´´s Univ., Belfast, UK
Volume :
47
Issue :
4
fYear :
1999
fDate :
4/1/1999 12:00:00 AM
Firstpage :
506
Lastpage :
509
Abstract :
An explicit formula relating Schottky-diode junction capacitance (Cj) as a function of diode bias (Vdc) and Gaussian doping profile (k) has been curve fitted to a one-dimensional numerical analysis. Two-dimensional physical simulation and the explicit formula have been applied to a Schottky diode with both simulated and analytic results compared against measurement. Incomplete ionization, edge effects, and additional charge created by traps have also been investigated using a physical simulation package, and results are presented for different trap densities. The stated formula has been implemented for a Schottky diode model using a symbolically defined device within the HP-MDS harmonic-balance simulator. This has been used as a building block for a nonlinear transmission-line (NLTL) doubler design with simulated and measured second harmonic-power output being presented. The formula, which is easily implemented in computer-aided design tools, is important for NLTL modeling and design
Keywords :
Gaussian distribution; Schottky diodes; doping profiles; electron traps; harmonics; microwave diodes; semiconductor device models; Gaussian doping profile; Schottky-diode junction capacitance; diode CV characteristics; diode bias; doping profile; edge effects; nonlinear transmission-line doubler; one-dimensional numerical analysis; physical simulation package; second harmonic-power output; symbolically defined device; trap densities; two-dimensional physical simulation; Analytical models; Capacitance; Computational modeling; Design automation; Doping profiles; Ionization; Numerical analysis; Packaging; Schottky diodes; Transmission lines;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.754885
Filename :
754885
Link To Document :
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