• DocumentCode
    1492909
  • Title

    Simulations on Elastoplasticity of the Monolithic Aluminum Armature Under the Contact Force

  • Author

    Li, Mintang ; Yan, Ping ; Yuan, Weiqun ; Sun, Yaohong ; Tao Shao ; Shao, Tao ; Zhou, Yuan

  • Author_Institution
    Inst. of Electr. Eng., Chinese Acad. of Sci., Beijing, China
  • Volume
    39
  • Issue
    1
  • fYear
    2011
  • Firstpage
    426
  • Lastpage
    430
  • Abstract
    Keeping good contact of the armature-rail interface (ARI) is essential for electromagnetic launch technology. To investigate the contact mechanism of ARI and improve the contact condition, the elastic-plastic deformation of the monolithic aluminum armature (MAA) under the contact force is analyzed. Contact force, contact area, and the distribution of contact pressure are calculated, and several kinds of armatures with different arm lengths are compared under the same conditions. The calculating loads include the pretightening force under the initial preload and the electromagnetic force from the pulse current. The simulation results show that both the contact force and the contact area under the plastic deformation are bigger than those under the elastic deformation, which is due to the higher spring-back force and displacement. A longer arm length can result in better flexibility and lower contact force. The effect of the electromagnetic force versus the contact force is increased with the arm length.
  • Keywords
    aluminium; elastic deformation; elastoplasticity; electromagnetic forces; electromagnetic launchers; plastic deformation; Al; armature-rail interface; contact area; contact force; contact pressure distribution; elastic-plastic deformation; elastoplasticity simulation; electromagnetic force; electromagnetic launch technology; monolithic aluminum armature; pulse current; spring-back force; Aluminum armature; contact force; elastoplasticity; electromagnetic force;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2010.2048127
  • Filename
    5466065