DocumentCode :
1492909
Title :
Simulations on Elastoplasticity of the Monolithic Aluminum Armature Under the Contact Force
Author :
Li, Mintang ; Yan, Ping ; Yuan, Weiqun ; Sun, Yaohong ; Tao Shao ; Shao, Tao ; Zhou, Yuan
Author_Institution :
Inst. of Electr. Eng., Chinese Acad. of Sci., Beijing, China
Volume :
39
Issue :
1
fYear :
2011
Firstpage :
426
Lastpage :
430
Abstract :
Keeping good contact of the armature-rail interface (ARI) is essential for electromagnetic launch technology. To investigate the contact mechanism of ARI and improve the contact condition, the elastic-plastic deformation of the monolithic aluminum armature (MAA) under the contact force is analyzed. Contact force, contact area, and the distribution of contact pressure are calculated, and several kinds of armatures with different arm lengths are compared under the same conditions. The calculating loads include the pretightening force under the initial preload and the electromagnetic force from the pulse current. The simulation results show that both the contact force and the contact area under the plastic deformation are bigger than those under the elastic deformation, which is due to the higher spring-back force and displacement. A longer arm length can result in better flexibility and lower contact force. The effect of the electromagnetic force versus the contact force is increased with the arm length.
Keywords :
aluminium; elastic deformation; elastoplasticity; electromagnetic forces; electromagnetic launchers; plastic deformation; Al; armature-rail interface; contact area; contact force; contact pressure distribution; elastic-plastic deformation; elastoplasticity simulation; electromagnetic force; electromagnetic launch technology; monolithic aluminum armature; pulse current; spring-back force; Aluminum armature; contact force; elastoplasticity; electromagnetic force;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2010.2048127
Filename :
5466065
Link To Document :
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