Title :
Flexible Single-Component-Polymer Resistive Memory for Ultrafast and Highly Compatible Nonvolatile Memory Applications
Author :
Kuang, Yongbian ; Huang, Ru ; Tang, Yu ; Ding, Wei ; Zhang, Lijie ; Wang, Yangyuan
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fDate :
7/1/2010 12:00:00 AM
Abstract :
A novel flexible polymer resistive memory device based on single-component polymer polychloro-para-xylylene (parylene-C) sandwiched between Al or Cu top electrode and W bottom electrode is presented in this letter. With 4 × 4 crossbar array, the polymer memory device is fabricated by standard photolithograph technology, due to the chemical stability and the immunity of parylene-C to the chemicals and solvents in lithographic process. The device exhibits a good memory margin of more than 107 on/off current ratio, as well as ultrafast programming/erasing speed (<;15 ns). Moreover, a good retention time of more than 2.5 × 105 s and a cycling endurance of more than 130 program-read-erase-read cycles are obtained in this polymer memory device. The successfully demonstrated performance of this polymer memory shows great potential for transparent, flexible, and high-density memory applications and hybrid integration with CMOS back-end process.
Keywords :
CMOS integrated circuits; conducting polymers; photolithography; random-access storage; CMOS back-end process; chemical stability; crossbar array; cycling endurance; electrode; flexible polymer resistive memory device; flexible single-component-polymer resistive memory; lithographic process; nonvolatile memory; parylene-C; photolithograph technology; program-read-erase-read cycle; single-component polymer polychloro-para-xylylene; Organic memory; parylene-C; polymer resistive memory; single component;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2048297