DocumentCode :
1493895
Title :
Anomalous Capacitance Induced by GIDL in P-Channel LTPS TFTs
Author :
Lin, Chia-Sheng ; Chen, Ying-Chung ; Chang, Ting-Chang ; Chen, Shih-Ching ; Jian, Fu-Yen ; Li, Hung-Wei ; Chen, Te-Chih ; Weng, Chi-Feng ; Lu, Jin ; Hsu, Wei-Che
Author_Institution :
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
Volume :
30
Issue :
11
fYear :
2009
Firstpage :
1179
Lastpage :
1181
Abstract :
In this letter, a mechanism of anomalous capacitance in p-channel low-temperature polycrystalline silicon thin-film transistors (LTPS TFTs) was investigated. In general, the effective capacitance was only the overlap region and independent with the frequency in LTPS TFTs under the off state. However, our experimental results reveal that the capacitance was related with the leakage current and that it was dependent with the measurement frequencies when operated at the off-state region. The increase of the capacitance value is verified to be due to the increase of the electron capacitance originating from a gate-induced drain-leakage (GIDL) one. Nevertheless, the GIDL-induced electron capacitance can be suppressed by employing band-to-band hot electron stress.
Keywords :
capacitance; leakage currents; semiconductor device measurement; silicon; thin film transistors; GIDL; Si; anomalous capacitance; band-to-band hot electron stress; electron capacitance; gate-induced drain-leakage; leakage current; low-temperature polycrystalline silicon; p-channel LTPS TFT; thin-film transistors; Displays; low-temperature polycrystalline silicon thin-film transistors (LTPS TFTs);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2031504
Filename :
5280336
Link To Document :
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