DocumentCode
1494477
Title
Submicron NbN Josephson tunnel junctions for digital applications
Author
Aoyagi, M. ; Shoji, A. ; Kosaka, S. ; Nakagawa, H. ; Takada, S.
Author_Institution
Electrotech. Lab., Ibaraki, Japan
Volume
25
Issue
2
fYear
1989
fDate
3/1/1989 12:00:00 AM
Firstpage
1223
Lastpage
1226
Abstract
Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8-μm-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed
Keywords
Josephson effect; magnesium compounds; niobium compounds; superconducting junction devices; superconducting logic circuits; superconductive tunnelling; 0.8 micron; EB direct writing; Josephson integrated circuits; Josephson tunnel junctions; NbN-MgO-NbN; all-refractory fabrication process; cross-line patterning; logic circuits; logic gate; Fabrication; Insulation; Josephson junctions; Logic circuits; Logic gates; Niobium; Protection; Resistors; Resists; Writing;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.92516
Filename
92516
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