Title :
Enhancement-mode Al0.66In0.34As/Ga0.67 In0.33As metamorphic HEMT, modeling and measurements
Author :
Boudrissa, Mustafa ; Delos, Elisabeth ; Gaquiere, C. ; Rousseau, Michel ; Cordier, Yvon ; Theron, Didier ; Jaeger, J.C.
Author_Institution :
Inst. d´´Electron. et de Microelectron. du Nord, Villeneuve d´´Ascq, France
fDate :
6/1/2001 12:00:00 AM
Abstract :
This paper exhibits experimental and theoretical results on metamorphic high-electron mobility transistor (MM-HEMT). Modeling and measurements provide a better knowledge of device physics which allows us to optimize device structures. We present 10-GHz power performances, pulse and gate measurements, and two-dimensional (2-D) hydrodynamic modeling of enhancement-mode (E-mode) Al0.66In0.34As/Ga0.67In0.33 As NM-HEMT devices. It is the first time that cap layer thickness has been studied for a MM-HEMT. A typical reverse breakdown voltage of 16 V has been obtained. Gate current issued from impact ionization has been shown, for the first time, in such a device. The 2-D hydrodynamic model is a useful tool for cost engineering because it brings more information in terms of physical quantity distributions, necessary to predict breakdown behavior of FET. The 10-GHz measurements with a load-pull power set-up demonstrate the capabilities for a thick cap device with large gate-to-drain extension since an output power of 140 mW/mm have been obtained which is the state-of-the-art for such a device. These results obtained confirm the great interest of the structures for power application systems. The only work reported, to our knowledge, using a MM-HEMT structure in E-mode with an indium content close to 50% has been studied by Eisenbeiser et al.. Their typical gate-to-drain breakdown voltage was 5.2 V. The 0.6 μm ×3 mm devices exhibited 30 mW/mm at 850 MHz
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; impact ionisation; indium compounds; microwave field effect transistors; microwave power transistors; power HEMT; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 10 GHz; 16 V; Al0.66In0.34As-Ga0.67In0.33 As; breakdown behavior; cap layer thickness; device physics; device structures; enhancement-mode metamorphic HEMT; gate measurements; gate-to-drain extension; impact ionization; load-pull power set-up; physical quantity distributions; reverse breakdown voltage; two-dimensional hydrodynamic modeling; HEMTs; Hydrodynamics; Impact ionization; MODFETs; Performance evaluation; Physics; Power measurement; Predictive models; Pulse measurements; Two dimensional displays;
Journal_Title :
Electron Devices, IEEE Transactions on