• DocumentCode
    1494549
  • Title

    Enhancement-mode Al0.66In0.34As/Ga0.67 In0.33As metamorphic HEMT, modeling and measurements

  • Author

    Boudrissa, Mustafa ; Delos, Elisabeth ; Gaquiere, C. ; Rousseau, Michel ; Cordier, Yvon ; Theron, Didier ; Jaeger, J.C.

  • Author_Institution
    Inst. d´´Electron. et de Microelectron. du Nord, Villeneuve d´´Ascq, France
  • Volume
    48
  • Issue
    6
  • fYear
    2001
  • fDate
    6/1/2001 12:00:00 AM
  • Firstpage
    1037
  • Lastpage
    1044
  • Abstract
    This paper exhibits experimental and theoretical results on metamorphic high-electron mobility transistor (MM-HEMT). Modeling and measurements provide a better knowledge of device physics which allows us to optimize device structures. We present 10-GHz power performances, pulse and gate measurements, and two-dimensional (2-D) hydrodynamic modeling of enhancement-mode (E-mode) Al0.66In0.34As/Ga0.67In0.33 As NM-HEMT devices. It is the first time that cap layer thickness has been studied for a MM-HEMT. A typical reverse breakdown voltage of 16 V has been obtained. Gate current issued from impact ionization has been shown, for the first time, in such a device. The 2-D hydrodynamic model is a useful tool for cost engineering because it brings more information in terms of physical quantity distributions, necessary to predict breakdown behavior of FET. The 10-GHz measurements with a load-pull power set-up demonstrate the capabilities for a thick cap device with large gate-to-drain extension since an output power of 140 mW/mm have been obtained which is the state-of-the-art for such a device. These results obtained confirm the great interest of the structures for power application systems. The only work reported, to our knowledge, using a MM-HEMT structure in E-mode with an indium content close to 50% has been studied by Eisenbeiser et al.. Their typical gate-to-drain breakdown voltage was 5.2 V. The 0.6 μm ×3 mm devices exhibited 30 mW/mm at 850 MHz
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; impact ionisation; indium compounds; microwave field effect transistors; microwave power transistors; power HEMT; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; 10 GHz; 16 V; Al0.66In0.34As-Ga0.67In0.33 As; breakdown behavior; cap layer thickness; device physics; device structures; enhancement-mode metamorphic HEMT; gate measurements; gate-to-drain extension; impact ionization; load-pull power set-up; physical quantity distributions; reverse breakdown voltage; two-dimensional hydrodynamic modeling; HEMTs; Hydrodynamics; Impact ionization; MODFETs; Performance evaluation; Physics; Power measurement; Predictive models; Pulse measurements; Two dimensional displays;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.925223
  • Filename
    925223