• DocumentCode
    1494705
  • Title

    Cutoff frequency and propagation delay time of 1.5-nm gate oxide CMOS

  • Author

    Momose, Hisayo Sasaki ; Morifuji, Eiji ; Yoshitomi, Takashi ; Ohguro, Tatsuya ; Saito, Masanobu ; Iwai, Hiroshi

  • Author_Institution
    Toshiba Corp., Yokohama, Japan
  • Volume
    48
  • Issue
    6
  • fYear
    2001
  • fDate
    6/1/2001 12:00:00 AM
  • Firstpage
    1165
  • Lastpage
    1174
  • Abstract
    The high-frequency AC characteristics of 1.5-nm direct-tunneling gate SiO2 CMOS are described. Very high cutoff frequencies of 170 GHz and 235 GHz were obtained for 0.08-μm and 0.06-μm gate length nMOSFETs at room temperature. Cutoff frequency of 65 GHz was obtained for 0.15-μm gate length pMOSFETs using 1.5-nm gate SiO2 for the first time. The normal oscillations of the 1.5-nm gate SiO2 CMOS ring oscillators were also confirmed. In addition, this paper investigates the cutoff frequency and propagation delay time in recent small-geometry CMOS and discusses the effect of gate oxide thinning. The importance of reducing the gate oxide thickness in the direct-tunneling regime is discussed for sub-0.1-μm gate length CMOS in terms of high-frequency, high-speed operation
  • Keywords
    CMOS integrated circuits; delays; high-speed integrated circuits; low-power electronics; tunnelling; 0.06 micron; 0.08 micron; 0.15 micron; 1.5 nm; 170 GHz; 245 GHz; 65 GHz; Si-SiO2; cutoff frequency; direct-tunneling gate; gate oxide thinning; high-frequency AC characteristics; high-speed operation; propagation delay time; ring oscillators; small-geometry CMOS; Cutoff frequency; Insulation; Large scale integration; Leakage current; Logic; MOSFETs; Microprocessors; Propagation delay; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.925243
  • Filename
    925243