DocumentCode
1494762
Title
On the iterative schemes to obtain base doping profiles for reducing base transit time in a bipolar transistor
Author
Kumar, M. Jagadesh ; Patri, Vijay S.
Author_Institution
Dept. of Electr. Eng., Indian Inst. of Technol., New Delhi, India
Volume
48
Issue
6
fYear
2001
fDate
6/1/2001 12:00:00 AM
Firstpage
1222
Lastpage
1224
Abstract
This paper shows that base doping profiles obtained using any iterative scheme for reducing the base transit time τb in bipolar transistors for a given neutral base width must take into account the heavy doping effects implicitly. Comparing our results with those reported earlier, we demonstrate that if the heavy doping effects are not implicitly included in the iterative scheme it will result in a completely different base doping profile leading to an overestimation of base transit time and underestimation of base resistance
Keywords
bipolar transistors; doping profiles; heavily doped semiconductors; iterative methods; base doping profile; base doping profiles; base resistance; base transit time; bipolar transistor; heavy doping effects; iterative schemes; neutral base width; Bipolar transistors; Delay effects; Digital signal processing; Doping profiles; Electric resistance; Frequency; Instruments; Photonic band gap; Semiconductor process modeling; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.925251
Filename
925251
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